Experience the event enabling the mass-produced miniaturized products and systems of the future.
Micro- and nanofabricated electromechanical and optical components, created by batch processing, provide the missing links to the mass-produced miniaturized products and systems of the future, superior in cost, performance, and reliability. Be a part of this evolution by presenting your research in this international premier symposium.
Each year we also commit one of our conferences to illuminate an emerging area of interest. Following up the success of last year's conference on the Micro-Nano Interface, this year's focus will be on Transducers at the Micro-Nano Interface.
Awards for Best Papers will be presented for each conference and for the overall Symposium. The most outstanding papers from each conference of the Symposium will be recommended for submission to the Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3), SPIE's refereed and archival journal of progress in the science and technology of lithographic, fabrication, packaging, and integration technologies for electronics, photonics, MOEMS, and MEMS.
Our 2008 symposium will feature exciting joint sessions among our conferences and other SPIE Photonics West symposia, facilitating interaction of a larger and diversified group of attendees and participants. Our symposium will kick off, as always, with outstanding plenary speakers covering cross-cutting and synergistic topics, while our individual technical conferences will stimulate audiences on more focused topics with excellent keynote speakers, invited papers, and exciting panel discussions. Many selected short courses will complement the conference technical sessions. As a participant, you will have the opportunity to meet innovative people, undertake new initiatives, invigorate your thinking, and motivate yourself towards your goals and objectives.
Venue: San Jose Convention Center San Jose, California, USA
Dates: 19 - 20 January 2008