The Annual SPIE/BACUS Symposium is the premier worldwide technical conference and exhibition for the photomask industry.
The Annual SPIE/BACUS Symposium is the premier worldwide technical conference and exhibition for the photomask industry. This year's four-day symposium will give you the chance to engage with the most up-to-date research on emerging and on-going issues facing the photomask industry in advanced lithography and their manufacturing and data solutions. With the deep sub-wavelength era upon us, the industry's progress will depend on the successful integration and optimization of design, maskmaking, and wafer fabrication.
Help solve the most pressing issues in:
• Mask Infrastructure
• Mask Integration
• Emerging Mask Technology
• Mask Business
Venue: Monterey Marriott and Monterey Conference Center Monterey, California, USA
Dates: 9 - 10 September 2008
Web URL: http://spie.org/photomask.xml?WT.mc_id=RCALENDARW